Magnetoresistance in thin films

D. Kumar, Rajiv K. Singh, C. Lee

Research output: Contribution to journalArticlepeer-review

18 Scopus citations


Interesting magnetotransport behavior has been observed in (Formula presented) films. The films are grown in situ on (100) (Formula presented) substrates using a pulsed-laser-deposition technique. Microstructural characterization carried out on these films has shown that the films are smooth, free from impurity phases, and highly textured. The electrical resistance and magnetoresistance (MR) have been measured in the 10-300 K range in magnetic field up to 5 T using a SQUID magnetometer. With the application of magnetic fields of 0.5 and 5 T, the resistance of the films has been found to drop spectacularly, resulting in the realization of MR ratios (at (Formula presented)) as high as (Formula presented) and (Formula presented) respectively.

Original languageEnglish
Pages (from-to)13666-13668
Number of pages3
JournalPhysical Review B - Condensed Matter and Materials Physics
Issue number21
StatePublished - 1997
Externally publishedYes


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