Magneto-lithography, a simple and inexpensive method for high-throughput, surface patterning

Amos Bardea, Alexander Yoffe

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Magneto-lithography (ML) is based on patterning magnetic field on a substrate, using paramagnetic or diamagnetic masks that define the shape and strength of the magnetic field. ML is a 'bottom-up' method but at the same time, it provides desired high throughput capabilities for mass production. It is based on applying a magnetic field on the substrate using paramagnetic metal masks that define the spatial distribution and shape of the applied field. The second component in ML is ferromagnetic nanoparticles that are assembled onto the substrate according to the field induced by the mask. We demonstrate the use of various methods of ML for common microelectronic processes. ML has the potential to become the method of choice in the future, both in the microelectronic industry as well as for chemical patterning of surfaces.

Original languageEnglish
Title of host publication2016 IEEE International Conference on the Science of Electrical Engineering, ICSEE 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509021529
DOIs
StatePublished - 4 Jan 2017
Externally publishedYes
Event2016 IEEE International Conference on the Science of Electrical Engineering, ICSEE 2016 - Eilat, Israel
Duration: 16 Nov 201618 Nov 2016

Publication series

Name2016 IEEE International Conference on the Science of Electrical Engineering, ICSEE 2016

Conference

Conference2016 IEEE International Conference on the Science of Electrical Engineering, ICSEE 2016
Country/TerritoryIsrael
CityEilat
Period16/11/1618/11/16

Bibliographical note

Publisher Copyright:
© 2016 IEEE.

Keywords

  • deposition
  • etch
  • lithography
  • mask
  • nanoparticles
  • patterning

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