Abstract
In this paper, a low voltage ripple-carry adder (RCA), designed for the ultra-thin body and box (UTBB) fully-depleted silicon-on-insulator (FD-SOI) technology, is proposed. The circuit synergistically benefits from low-granularity back-bias control to improve performance in conjunction with the integration of both NMOS and PMOS devices into a common well configuration which allows highly efficient area utilization. The design was compared over standard CMOS and DTMOS solutions. Comparative post-layout results demonstrate that the suggested approach improves energy consumption up to 57% in comparison to the equivalent DTMOS design and reduces delay up to 30% with similar energy consumption, when compared to the conventional CMOS implementation. In addition, reduced silicon area occupancy is achieved.
Original language | English |
---|---|
Title of host publication | 2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 9781509002597 |
DOIs | |
State | Published - 20 Nov 2015 |
Event | IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015 - Rohnert Park, United States Duration: 5 Oct 2015 → 8 Oct 2015 |
Publication series
Name | 2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015 |
---|
Conference
Conference | IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2015 |
---|---|
Country/Territory | United States |
City | Rohnert Park |
Period | 5/10/15 → 8/10/15 |
Bibliographical note
Publisher Copyright:© 2015 IEEE.
Keywords
- FD-SOI
- gate-level body biasing
- single well