Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

Rochael J. Collins, Hyunjung Shin, Mark R. DeGuire, Arthur H. Heuer, Chaim N. Sukenik

Research output: Contribution to journalArticlepeer-review

133 Scopus citations

Abstract

Patterned thin films of TiO2 were deposited from aqueous solution onto photopatterned self-assembled monolayer (SAM) films on Si substrates. Regions of the SAM containing sulfonate surface functionality were created by the photo-oxidation of initially deposited thioacetate groups through a mask. The nanocrystalline TiO2-on-SAM films were deposited selectively on the photolyzed regions of the SAM. The electrical properties of such films were assessed for potential microelectronic device applications. Current-voltage and capacitance-voltage measurements made on nonpatterned TiO2 films yielded values of relative permittivity ranging from 24 to 57, film resistivities of 1.0-1.5×109 Ω cm and breakdown voltages in excess of 1 MV/cm.

Original languageEnglish
Pages (from-to)860-862
Number of pages3
JournalApplied Physics Letters
Volume69
Issue number6
DOIs
StatePublished - 5 Aug 1996

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