Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas

D. R. Gilbert; R. K. Singh

doi:10.1557/proc-388-329

Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas

D. R. Gilbert
, R. K. Singh

University of Florida

Research output: Contribution to journal › Conference article › peer-review

Abstract

We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.

Original language	English
Pages (from-to)	329-334
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	388
DOIs	https://doi.org/10.1557/proc-388-329
State	Published - 1995
Externally published	Yes
Event	Proceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA Duration: 17 Apr 1995 → 21 Apr 1995

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10.1557/proc-388-329

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title = "Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas",

abstract = "We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.",

author = "Gilbert, \{D. R.\} and Singh, \{R. K.\}",

year = "1995",

doi = "10.1557/proc-388-329",

language = "אנגלית",

volume = "388",

pages = "329--334",

journal = "Materials Research Society Symposium - Proceedings",

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publisher = "Materials Research Society",

note = "Proceedings of the 1995 MRS Spring Meeting ; Conference date: 17-04-1995 Through 21-04-1995",

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AU - Singh, R. K.

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AB - We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.

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DO - 10.1557/proc-388-329

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AN - SCOPUS:0029505569

SN - 0272-9172

VL - 388

SP - 329

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JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1995 MRS Spring Meeting

Y2 - 17 April 1995 through 21 April 1995

ER -

Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas

Abstract

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