TY - JOUR
T1 - Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas
AU - Gilbert, D. R.
AU - Singh, R. K.
PY - 1995
Y1 - 1995
N2 - We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.
AB - We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.
UR - https://www.scopus.com/pages/publications/0029505569
U2 - 10.1557/proc-388-329
DO - 10.1557/proc-388-329
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AN - SCOPUS:0029505569
SN - 0272-9172
VL - 388
SP - 329
EP - 334
JO - Materials Research Society Symposium - Proceedings
JF - Materials Research Society Symposium - Proceedings
T2 - Proceedings of the 1995 MRS Spring Meeting
Y2 - 17 April 1995 through 21 April 1995
ER -