Low temperature deposition of diamond thin films using electron cyclotron resonance plasmas

D. R. Gilbert, R. K. Singh

Research output: Contribution to journalConference articlepeer-review

Abstract

We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550-750°C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.

Original languageEnglish
Pages (from-to)329-334
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume388
DOIs
StatePublished - 1995
Externally publishedYes
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: 17 Apr 199521 Apr 1995

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