Lithographically Patterned Functional Polymer-Graphene Hybrids for Nanoscale Electronics

Hadas Alon, Chen Stern, Moshe Kirshner, Ofer Sinai, Michal Wasserman, Ryan Selhorst, Raymond Gasper, Ashwin Ramasubramaniam, Todd Emrick, Doron Naveh

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Two-dimensional (2D) materials are believed to hold significant promise in nanoscale optoelectronics. While significant progress has been made in this field over the past decade, the ability to control charge carrier density with high spatial precision remains an outstanding challenge in 2D devices. We present an approach that simultaneously addresses the dual issues of charge-carrier doping and spatial precision based on a functional lithographic resist that employs methacrylate polymers containing zwitterionic sulfobetaine pendent groups for noncovalent surface doping of 2D materials. We demonstrate scalable approaches for patterning these polymer films via electron-beam lithography, achieving precise spatial control over carrier doping for fabrication of high-quality, all-2D, lateral p-n junctions in graphene. Our approach preserves all of the desirable structural and electronic properties of graphene while exclusively modifying its surface potential. The functional polymer resist platform and concept offers a facile route toward lithographic doping of graphene- and other 2D material-based optoelectronic devices.

Original languageEnglish
Pages (from-to)1928-1933
Number of pages6
JournalACS Nano
Volume12
Issue number2
DOIs
StatePublished - 27 Feb 2018

Bibliographical note

Publisher Copyright:
© 2018 American Chemical Society.

Keywords

  • doping
  • graphene
  • interface
  • p-n junction
  • psbma
  • zwitterion

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