Liquid-vapor density profile of helium: An x-ray study

L. B. Lurio; T. A. Rabedeau; P. S. Pershan; Isaac F. Silvera; M. Deutsch; S. D. Kosowsky; B. M. Ocko

doi:10.1103/PhysRevLett.68.2628

Liquid-vapor density profile of helium: An x-ray study

L. B. Lurio, T. A. Rabedeau, P. S. Pershan, Isaac F. Silvera, M. Deutsch, S. D. Kosowsky, B. M. Ocko

Research output: Contribution to journal › Article › peer-review

70 Scopus citations

Abstract

The average liquid-vapor density profiles (z) of thick He4 films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.

Original language	English
Pages (from-to)	2628-2631
Number of pages	4
Journal	Physical Review Letters
Volume	68
Issue number	17
DOIs	https://doi.org/10.1103/PhysRevLett.68.2628
State	Published - 1992
Externally published	Yes

Access to Document

10.1103/PhysRevLett.68.2628

Cite this

@article{23c0e615c8d24e3aae14b010ee49850b,

title = "Liquid-vapor density profile of helium: An x-ray study",

abstract = "The average liquid-vapor density profiles (z) of thick He4 films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.",

author = "Lurio, {L. B.} and Rabedeau, {T. A.} and Pershan, {P. S.} and Silvera, {Isaac F.} and M. Deutsch and Kosowsky, {S. D.} and Ocko, {B. M.}",

year = "1992",

doi = "10.1103/PhysRevLett.68.2628",

language = "אנגלית",

volume = "68",

pages = "2628--2631",

journal = "Physical Review Letters",

issn = "0031-9007",

publisher = "American Physical Society",

number = "17",

}

TY - JOUR

T1 - Liquid-vapor density profile of helium

T2 - An x-ray study

AU - Lurio, L. B.

AU - Rabedeau, T. A.

AU - Pershan, P. S.

AU - Silvera, Isaac F.

AU - Deutsch, M.

AU - Kosowsky, S. D.

AU - Ocko, B. M.

PY - 1992

Y1 - 1992

N2 - The average liquid-vapor density profiles (z) of thick He4 films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.

AB - The average liquid-vapor density profiles (z) of thick He4 films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.

UR - http://www.scopus.com/inward/record.url?scp=4244214141&partnerID=8YFLogxK

U2 - 10.1103/PhysRevLett.68.2628

DO - 10.1103/PhysRevLett.68.2628

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:4244214141

SN - 0031-9007

VL - 68

SP - 2628

EP - 2631

JO - Physical Review Letters

JF - Physical Review Letters

IS - 17

ER -

Liquid-vapor density profile of helium: An x-ray study

Abstract

Access to Document

Other files and links

Fingerprint

Cite this