Liquid-vapor density profile of helium: An x-ray study

L. B. Lurio, T. A. Rabedeau, P. S. Pershan, Isaac F. Silvera, M. Deutsch, S. D. Kosowsky, B. M. Ocko

Research output: Contribution to journalArticlepeer-review

69 Scopus citations


The average liquid-vapor density profiles (z) of thick He4 films adsorbed onto a silicon substrate were measured using x-ray reflectivity. The results are well represented by a 90%-10% interfacial width of 9.2±1 at 1.13 K which extrapolates to a T=0 K, 90%-10% interfacial width of 7.6+1,-2. The sensitivity of the measurement to the width, shape, and asymmetry of the density profile is discussed.

Original languageEnglish
Pages (from-to)2628-2631
Number of pages4
JournalPhysical Review Letters
Issue number17
StatePublished - 1992
Externally publishedYes


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