Kinetics and mechanism of the C49 to C54 titanium disilicide phase transformation in nitrogen ambient

R. V. Nagabushnam, S. Sharan, G. Sandhu, V. R. Rakesh, R. K. Singh, P. Tiwari

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

The kinetics of the C49 to C54 TiSi2 phase transformation in nitrogen ambient have been investigated in a temperature range from 700 °C to 800 °C for a range of titanium film thicknesses (135 angstrom to 350 angstrom) using sheet resistance measurement, Auger electron spectroscopy(AES), Rutherford backscattering spectroscopy(RBS) and transmission electron microscopy(TEM). About 80% of the titanium converts to titanium silicide with the rest converting to titanium nitride. The activation energies obtained for the C49 to C54 transformation in nitrogen ambient are lower, at least by 2-2.25 eV, than that obtained for the transformations occurring either in argon ambient or vacuum environment. This has been explained with a model involving stress state of titanium silicide film with titanium nitride overlayer.

Original languageEnglish
Pages (from-to)113-118
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume402
StatePublished - 1996
Externally publishedYes
EventProceedings of the 1995 MRS Fall Symposium - Boston, MA, USA
Duration: 27 Nov 199530 Nov 1995

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