Investigation of chemical mechanical polishing of zinc oxide thin films

Keyphrases

• Zinc Oxide 100%
• Zinc Oxide Thin Films 100%
• Chemical Mechanical Polishing 100%
• Removal Rate 66%
• Commercially Available 33%
• Single Crystal 33%
• Detrimental Effects 33%
• Device Performance 33%
• Surface Roughness 33%
• Smooth Surface 33%
• Polycrystalline Thin Films 33%
• High Surface Roughness 33%
• As-grown 33%
• RMS Roughness 33%
• Polishing Process 33%
• Layer Performance 33%
• Role of pH 33%
• Polishing Parameters 33%
• Polishing Characteristics 33%
• Bioavailable Zinc 33%

Engineering

• Chemical Mechanical Polishing 100%
• Thin Films 100%
• Removal Rate 66%
• Detrimental Effect 33%
• Device Performance 33%
• Polishing Process 33%
• Smooth Surface 33%
• Polycrystalline 33%

Material Science

• Zinc Oxide 100%
• Chemical Mechanical Planarization 100%
• Thin Films 100%
• Surface Roughness 40%
• Single Crystal 20%