Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
D. Nishijima, A. Kreter, M. J. Baldwin, D. Borodin, A. Eksaeva, D. Hwangbo, S. Kajita, M. Miyamoto, N. Ohno, M. Patino, A. Pospieszczyk, M. Rasinski, T. Schlummer, A. Terra, R. P. Doerner
Research output: Contribution to journal › Article › peer-review
18Scopus
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