InAsSb-based XB _nn bariodes grown by molecular beam epitaxy on GaAs

XB _nn mid-wave infrared (MWIR) detector arrays aimed at high operating temperature (HOT) applications, also known as barrier detectors or bariodes, are based on device elements with an InAsSb/AlSbAs heterostructure. There is no depletion layer in the narrow bandgap active layer of such devices, suppressing the usual Generation-Recombination (G-R) and Trap Assisted Tunneling (TAT) mechanisms for dark current that exist in standard narrow bandgap diodes. This yields lower dark currents in bariodes than in diodes with the same bandgap wavelength. InAsSb-bariode detectors, grown on lattice matched GaSb substrates have been shown previously to exhibit low dark current densities of ∼10 ^-7 A/cm ² at 150 K. In this communication we show crystallographic and electro-optical characteristics of bariode structures grown on GaAs. Although the 7.8% mismatch causes a high density of dislocations, the devices still demonstrate electr-optical performance comparable with equivalent structures grown on GaSb, both for test devices and for focal plane array detectors (FPAs) with a 640×512 pixel format and a 15 μm pitch. This is in contrast to the behavior reported for InAsSb pin photodiodes grown on lattice mismatched substrates. The large leakage currents seen in the latter and attributed to a TAT mechanism, do not occur in the InAsSb-based bariodes grown on GaAs.