TY - JOUR
T1 - In situ fabrication of epitaxial YBa2Cu3O7 films on lattice-mismatched (100) YS-ZrO2 substrates by the pulsed laser evaporation method
AU - Singh, R. K.
AU - Narayan, J.
AU - Singh, A. K.
PY - 1990
Y1 - 1990
N2 - The formation of good quality epitaxial c-axis-perpendicular YBa 2 Cu3 O7 superconducting thin films on (100) yttria-stabilized-zirconia (YSZ) substrates in the temperature range of 550-650 °C by a biased laser deposition method is reported. However, below 550 °C, the epitaxial quality of the films decreased appreciably with corresponding changes in the superconducting properties. For temperatures much below the critical temperature, the critical current density showed a linear variation with temperature, with a value of 1.0×106 A/cm 2 at 77 K and zero magnetic field. Because of the lattice mismatch between the substrate and the film, the interface was found to be highly strained in the presence of a large number of defects. The epitaxial nature and the crystalline quality of the films were determined by a number of techniques including Rutherford backscattering/channeling, electron channeling, cross-section transmission electron microscopy (TEM), and x-ray diffraction techniques. Rutherford backscattering channeling showed a minimum channeling yield of about 18%-25% for films deposited at and above 550 °C. Cross-section TEM and x-ray diffraction revealed the following thin film and substrate relationships: [001]film ∥[001]YSZ and [110]film ∥[100]YSZ. The electron channeling pattern taken from a large area confirmed the epitaxial relationship. The lattice parameters mismatch in this orientation has been found to gives rise to stresses near the interface.
AB - The formation of good quality epitaxial c-axis-perpendicular YBa 2 Cu3 O7 superconducting thin films on (100) yttria-stabilized-zirconia (YSZ) substrates in the temperature range of 550-650 °C by a biased laser deposition method is reported. However, below 550 °C, the epitaxial quality of the films decreased appreciably with corresponding changes in the superconducting properties. For temperatures much below the critical temperature, the critical current density showed a linear variation with temperature, with a value of 1.0×106 A/cm 2 at 77 K and zero magnetic field. Because of the lattice mismatch between the substrate and the film, the interface was found to be highly strained in the presence of a large number of defects. The epitaxial nature and the crystalline quality of the films were determined by a number of techniques including Rutherford backscattering/channeling, electron channeling, cross-section transmission electron microscopy (TEM), and x-ray diffraction techniques. Rutherford backscattering channeling showed a minimum channeling yield of about 18%-25% for films deposited at and above 550 °C. Cross-section TEM and x-ray diffraction revealed the following thin film and substrate relationships: [001]film ∥[001]YSZ and [110]film ∥[100]YSZ. The electron channeling pattern taken from a large area confirmed the epitaxial relationship. The lattice parameters mismatch in this orientation has been found to gives rise to stresses near the interface.
UR - http://www.scopus.com/inward/record.url?scp=0040467280&partnerID=8YFLogxK
U2 - 10.1063/1.345333
DO - 10.1063/1.345333
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AN - SCOPUS:0040467280
SN - 0021-8979
VL - 67
SP - 3452
EP - 3455
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 7
ER -