Highly resistive p-PbTe films with carrier concentration as low as 10 14 cm-3

V. Sandomirsky, A. V. Butenko, I. G. Kolobov, A. Ronen, Y. Schlesinger, A. Yu Sipatov, V. V. Volubuev

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

A model which showed that a high density of semiconductor-insulator interface states could deplete the entire film volume, if the film thickness was the order of Debye sceening length was presented. It was shown that such a situation could be realized when the interface between the semiconductor film and the substrate had a high concentration of trapping sites. It was shown that thin p-PbTe films, thermally deposited on mica substrate, had a low concentration of free holes, that resulted in a very high value of resistance. It was shown that such low concentration of free carriers allowed investigations to be one on a whole series of phenomena in AIVBVI semiconductors.

Original languageEnglish
Pages (from-to)3732-3734
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number19
DOIs
StatePublished - 10 May 2004

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