TY - JOUR
T1 - Geometric superresolution and field-of-view extension achieved using digital mirror devices
AU - Zlotnik, Alex
AU - Kapellner, Yuval
AU - Afik, Zvika
AU - Layani, Itshak
AU - Zalevsky, Zeev
PY - 2013
Y1 - 2013
N2 - Superresolving configurations that integrate two digital mirror devices (DMDs) in the aperture and/or in the intermediate image plane are presented. The usage of DMDs allows obtaining geometric resolution improvement, enhancing field of view (FOV), and reducing aberrations such as defocusing and blurring (obtained due to relative movement during the integration time of the camera). The idea behind all the above-mentioned applications is to use the DMDs to properly encode the space and the spatial frequency domains such that the object's information can be separated from the above mentioned aberrations, distortions, limitations, and noises. The compressed sensing concept is applied in order to allow capturing in time-less images than the obtainable improvement factor (of resolution, of FOV, or of aberration correction).
AB - Superresolving configurations that integrate two digital mirror devices (DMDs) in the aperture and/or in the intermediate image plane are presented. The usage of DMDs allows obtaining geometric resolution improvement, enhancing field of view (FOV), and reducing aberrations such as defocusing and blurring (obtained due to relative movement during the integration time of the camera). The idea behind all the above-mentioned applications is to use the DMDs to properly encode the space and the spatial frequency domains such that the object's information can be separated from the above mentioned aberrations, distortions, limitations, and noises. The compressed sensing concept is applied in order to allow capturing in time-less images than the obtainable improvement factor (of resolution, of FOV, or of aberration correction).
UR - http://www.scopus.com/inward/record.url?scp=84892720722&partnerID=8YFLogxK
U2 - 10.1117/1.jmm.12.3.033001
DO - 10.1117/1.jmm.12.3.033001
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AN - SCOPUS:84892720722
SN - 1932-5150
VL - 12
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
IS - 3
M1 - 033001
ER -