TY - JOUR
T1 - Generation of VLF mode instability by generalized distribution function in the presence of parallel AC electric field in Uranus
AU - Pandey, R. S.
AU - Singh, M.
AU - Kumar, Pramod
AU - Singh, K. M.
AU - Kumar, S.
PY - 2010/8
Y1 - 2010/8
N2 - VLF (very low frequency) mode instability with parallel AC electric field was studied for generalized loss-cone distribution with an index j, which is reducible to bi-Maxwellian, losscone and delta function for j = 0,1 and ∞. The particle trajectories and dispersion relation are obtained through a kinetic approach and method of characteristic solutions. The calculations are compared with the observations of low frequency waves of Voyager 2. The growth rate of plasma parameters suited to magnetosphere of Uranus is obtained. It is inferred that the magnitude as well as frequency of AC (alternating current) field increases the growth rate and widen the band width significantly. In addition to temperature anisotropy, particles in plasma having generalized loss-cone distribution provide an additional source of energy.
AB - VLF (very low frequency) mode instability with parallel AC electric field was studied for generalized loss-cone distribution with an index j, which is reducible to bi-Maxwellian, losscone and delta function for j = 0,1 and ∞. The particle trajectories and dispersion relation are obtained through a kinetic approach and method of characteristic solutions. The calculations are compared with the observations of low frequency waves of Voyager 2. The growth rate of plasma parameters suited to magnetosphere of Uranus is obtained. It is inferred that the magnitude as well as frequency of AC (alternating current) field increases the growth rate and widen the band width significantly. In addition to temperature anisotropy, particles in plasma having generalized loss-cone distribution provide an additional source of energy.
KW - Generation of VLF mode instability in Uranus
UR - http://www.scopus.com/inward/record.url?scp=77958569183&partnerID=8YFLogxK
U2 - 10.1088/1009-0630/12/4/08
DO - 10.1088/1009-0630/12/4/08
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AN - SCOPUS:77958569183
SN - 1009-0630
VL - 12
SP - 421
EP - 425
JO - Plasma Science and Technology
JF - Plasma Science and Technology
IS - 4
ER -