Fabrication of polymeric photonic structures using dip-pen nanolithography

Zeev Fradkin, Marcos Roitman, Amos Bardea, Roy Avrahamy, Yeoshua Bery, Hanan Ohana, Moshe Zohar

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.

Original languageEnglish
Article number013501
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Volume19
Issue number1
DOIs
StatePublished - 1 Jan 2020
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE).

Keywords

  • Dip-pen nanolithography
  • Phase mask
  • Pv cell

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