TY - JOUR
T1 - Fabrication of polymeric photonic structures using dip-pen nanolithography
AU - Fradkin, Zeev
AU - Roitman, Marcos
AU - Bardea, Amos
AU - Avrahamy, Roy
AU - Bery, Yeoshua
AU - Ohana, Hanan
AU - Zohar, Moshe
N1 - Publisher Copyright:
© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE).
PY - 2020/1/1
Y1 - 2020/1/1
N2 - Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.
AB - Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.
KW - Dip-pen nanolithography
KW - Phase mask
KW - Pv cell
UR - http://www.scopus.com/inward/record.url?scp=85082985352&partnerID=8YFLogxK
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AN - SCOPUS:85082985352
SN - 1932-5150
VL - 19
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
IS - 1
M1 - 013501
ER -