We experimentally demonstrate a self-aligned approach for the fabrication of nanoscale hybrid silicon-plasmonic waveguide fabricated by local oxidation of silicon (LOCOS). Implementation of the LOCOS technique provides compatibility with standard complementary metal-oxide-semiconductor technology and allows avoiding lateral misalignment between the silicon waveguide and the upper metallic layer. We directly measured the propagation and the coupling loss of the fabricated hybrid waveguide using a near-field scanning optical microscope. The demonstrated structure provides nanoscale confinement of light together with a reasonable propagation length of ∼100 μm. As such, it is expected to become an important building block in future on-chip optoelectronic circuitry.
|Journal||Applied Physics Letters|
|State||Published - 4 Oct 2010|
Bibliographical noteFunding Information:
The authors I.G. and B.D. equally contributed to the work. The authors acknowledge fruitful discussions with Joseph Shappir and support from David Shlosberg and Noa Mazursky. The research was funded in parts by the U.S.-Israel binational science foundation, the Israeli Science Foundation, and the Peter Brojde Center for Innovative Engineering and Computer Science. The hybrid waveguides were fabricated at the Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem.