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Excimer laser planarization of diamond films
Dong Gu Lee
, S. D. Harkness
, Rajiv K. Singh
University of Florida
Research output
:
Contribution to journal
›
Conference article
›
peer-review
6
Scopus citations
Overview
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Dive into the research topics of 'Excimer laser planarization of diamond films'. Together they form a unique fingerprint.
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Keyphrases
Etching Rate
100%
Diamond
100%
Diamond Film
100%
Excimer Laser
100%
Planarization
100%
Laser Fluence
66%
Threshold Energy Density
66%
Surface Normal
33%
Graphite
33%
Scanning Electron Microscopy
33%
Surface Roughness
33%
Laser Pulse
33%
Temperature Variation
33%
Crystal Plane
33%
Incidence Angle
33%
Reaction Gas
33%
Etching Behavior
33%
Diamond Surface
33%
Peak-to-valley
33%
KrF Excimer Laser
33%
Laser Incidence Angle
33%
DC Arc-discharge Plasma
33%
Plasma Jet
33%
Preferential Etching
33%
Polycrystalline Diamond Films
33%
Engineering
Diamond
100%
Excimer Laser
100%
Laser Planarization
100%
Laser Fluence
28%
Threshold Energy
28%
Energy Density
28%
Temperature Change
14%
Angle of Incidence
14%
Planarization
14%
Chemical Vapor Deposition
14%
Incidence Angle
14%
Polycrystalline Diamond
14%
Material Science
Diamond
100%
Diamond Films
100%
Energy Density
50%
Film
25%
Scanning Electron Microscopy
25%
Chemical Vapor Deposition
25%
Crystalline Material
25%
Laser Pulse
25%
Surface Roughness
25%