Estimation of plasma absorption effects during pulsed laser ablation of high-critical-temperature superconductors

Rajiv K. Singh, John Viatella

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

During pulsed laser deposition of thin films, a significant amount of energy is coupled to the laser-generated plasma. The fraction of the energy absorbed in the plasma is a function of the incident laser wavelength, time-dependent plasma dimensions, and electron density. Due to time-varying parameters, a quantitative analysis of the plasma absorption is difficult. A method has been developed to estimate plasma absorption during deposition of thin films. In this model, the time-dependent plasma dimension is replaced by the time-dependent ablation depth, which can be easily determined. Using simulated absorption coefficient values, the ablation depth of the target as a function of energy density and laser wavelengths has been computed. These calculations have been compared with experimental results obtained from excimer laser deposition of high-Tc superconductors. Correlations between plasma absorption coefficient and incident laser photon energy have also been determined.

Original languageEnglish
Pages (from-to)1204-1206
Number of pages3
JournalJournal of Applied Physics
Volume75
Issue number2
DOIs
StatePublished - 1994
Externally publishedYes

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