Erratum: The effect of rf-irradiation on electrochemical deposition and its stabilization by nanoparticle doping (Journal of Electrochemical Society (2007) 154 (249))

Yael Katsir; Lior Miller; Yakir Aharonov; Eshel Ben Jacob

doi:10.1149/1.2728956

Erratum: The effect of rf-irradiation on electrochemical deposition and its stabilization by nanoparticle doping (Journal of Electrochemical Society (2007) 154 (249))

Yael Katsir, Lior Miller, Yakir Aharonov, Eshel Ben Jacob

Research output: Contribution to journal › Comment/debate

Original language	English
Pages (from-to)	S13
Journal	Journal of the Electrochemical Society
Volume	154
Issue number	6
DOIs	https://doi.org/10.1149/1.2728956
State	Published - 2007
Externally published	Yes

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10.1149/1.2728956

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Erratum: The effect of rf-irradiation on electrochemical deposition and its stabilization by nanoparticle doping (Journal of Electrochemical Society (2007) 154 (249))

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