Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder

Bhupesh Kumar; Sebastian A. Schulz

doi:10.1117/12.2645034

Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder

Bhupesh Kumar, Sebastian A. Schulz

University of St Andrews

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We performed numerical simulation and fabrication of a compact and sensitive high-resolution spectrometer, by superimposing controlled disorder on a photonic crystal. This simultaneously creates an in-plane speckle and suppresses out-of-plane scattering. We perform two- dimensional and three- dimensional numerical simulations to demonstrate reduced out-of-plane scattering and enhanced throughput in such disorder-enhanced photonic crystal structures compared to completely disorder structures without any compromise on resolution.

Original language	English
Title of host publication	Emerging Applications in Silicon Photonics III
Editors	Callum G. Littlejohns, Marc Sorel
Publisher	SPIE
ISBN (Electronic)	9781510657403
DOIs	https://doi.org/10.1117/12.2645034
State	Published - 2023
Externally published	Yes
Event	Emerging Applications in Silicon Photonics III 2022 - Birmingham, United Kingdom Duration: 6 Dec 2022 → 8 Dec 2022

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	12334
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Emerging Applications in Silicon Photonics III 2022
Country/Territory	United Kingdom
City	Birmingham
Period	6/12/22 → 8/12/22

Bibliographical note

Publisher Copyright:
© 2023 SPIE.

Funding

This work is funded by EPSRC project EP/V029975/1: ”DIsorder enhanced on-chip spectrometers.”

Funders	Funder number
Engineering and Physical Sciences Research Council	EP/V029975/1

Keywords

Correlated Disorder
Multiple scattering
Silicon Photonics
Spectrometer

Access to Document

10.1117/12.2645034

Cite this

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title = "Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder",

abstract = "We performed numerical simulation and fabrication of a compact and sensitive high-resolution spectrometer, by superimposing controlled disorder on a photonic crystal. This simultaneously creates an in-plane speckle and suppresses out-of-plane scattering. We perform two- dimensional and three- dimensional numerical simulations to demonstrate reduced out-of-plane scattering and enhanced throughput in such disorder-enhanced photonic crystal structures compared to completely disorder structures without any compromise on resolution.",

keywords = "Correlated Disorder, Multiple scattering, Silicon Photonics, Spectrometer",

author = "Bhupesh Kumar and Schulz, {Sebastian A.}",

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doi = "10.1117/12.2645034",

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Kumar, B & Schulz, SA 2023, Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder. in CG Littlejohns & M Sorel (eds), Emerging Applications in Silicon Photonics III., 1233408, Proceedings of SPIE - The International Society for Optical Engineering, vol. 12334, SPIE, Emerging Applications in Silicon Photonics III 2022, Birmingham, United Kingdom, 6/12/22. https://doi.org/10.1117/12.2645034

Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder. / Kumar, Bhupesh; Schulz, Sebastian A.
Emerging Applications in Silicon Photonics III. ed. / Callum G. Littlejohns; Marc Sorel. SPIE, 2023. 1233408 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12334).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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Enhancing Throughput of Disorder based Broadband Spectrometer using Correlated Disorder

Abstract

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Bibliographical note

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Keywords

Access to Document

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