Abstract
The evolution of a surface intersected by transgranular (TG) and intergranular (IG) edge voids under isotropic surface diffusion and electric field effects is simulated numerically under both mass-conserving and non-mass-conserving boundary conditions. A surprising similarity is found in the surface topology of transgranular voids between our non-mass-conserving model and Schimschak and Krug's [J. Appl. Phys. 87 (2000) 695] mass-conserving model. The electric field is found to slow the development of an intergranular groove along a positively tilted grain boundary (GB), and to cause thinning or thickening of grains under non-mass-conserving conditions.
Original language | English |
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Pages (from-to) | 347-350 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 466 |
Issue number | 1-2 |
DOIs | |
State | Published - 1 Nov 2004 |
Externally published | Yes |
Keywords
- Electromigration
- Modeling
- Simulation
- Surface evolution