Effects of substrate surface functionality on solution-deposited titania films

Hillel Pizem; Chaim N. Sukenik; Uma Sampathkumaran; Alan K. McIlwain; Mark R. De Guire

doi:10.1021/cm010776e

Effects of substrate surface functionality on solution-deposited titania films

Hillel Pizem, Chaim N. Sukenik, Uma Sampathkumaran, Alan K. McIlwain, Mark R. De Guire

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

119 Scopus citations

Abstract

Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55°C) and pH (2.88-3.88), can produce thin (0.1-1.0 μm), adherent titania (TiO₂) films. This paper reports a systematic study of LPD TiO₂ films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.

Original language	English
Pages (from-to)	2476-2485
Number of pages	10
Journal	Chemistry of Materials
Volume	14
Issue number	6
DOIs	https://doi.org/10.1021/cm010776e
State	Published - 2002

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abstract = "Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55°C) and pH (2.88-3.88), can produce thin (0.1-1.0 μm), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.",

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AU - Sukenik, Chaim N.

AU - Sampathkumaran, Uma

AU - McIlwain, Alan K.

AU - De Guire, Mark R.

PY - 2002

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N2 - Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55°C) and pH (2.88-3.88), can produce thin (0.1-1.0 μm), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.

AB - Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55°C) and pH (2.88-3.88), can produce thin (0.1-1.0 μm), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.

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JO - Chemistry of Materials

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Effects of substrate surface functionality on solution-deposited titania films

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