Effects of substrate surface functionality on solution-deposited titania films

Hillel Pizem, Chaim N. Sukenik, Uma Sampathkumaran, Alan K. McIlwain, Mark R. De Guire

Research output: Contribution to journalArticlepeer-review

119 Scopus citations


Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55°C) and pH (2.88-3.88), can produce thin (0.1-1.0 μm), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.

Original languageEnglish
Pages (from-to)2476-2485
Number of pages10
JournalChemistry of Materials
Issue number6
StatePublished - 2002


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