Dual-VT 4kb sub-VT memories with <1 pW/bit leakage in 65 nm CMOS

Oskar Andersson, Babak Mohammadi, Pascal Meinerzhagen, Andreas Burg, Joachim Neves Rodrigues

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

17 Scopus citations

Abstract

Two standard-cell based subthreshold (sub-VT) memories (SCMs) are presented. The SCMs accomplish the task of robust sub-VT storage and fill the gap of missing sub-VT memory compilers. The storage elements (latches) of these SCMs are custom-designed cells using a dual-V T approach to improve reliability and balance timing. Additionally, two read-logic styles are presented: 1) a segmented 3-state implementation that increases performance compared to a pure 3-state implementation; and 2) a purely MUX-based implementation with the first stage (NAND gate) integrated into the storage cell. Silicon measurements of two 4kb SCMs manufactured in a low-power 65nm CMOS technology show that read access speed increases by 4X and 8X compared to a pure 3-state implementation for the segmented 3-state and integrated NAND, respectively, while bit-access energy only increases by 2.7X and 2X to 39 and 29 fJ, respectively.

Original languageEnglish
Title of host publicationESSCIRC 2013 - Proceedings of the 39th European Solid-State Circuits Conference
Pages197-200
Number of pages4
DOIs
StatePublished - 2013
Externally publishedYes
Event39th European Solid-State Circuits Conference, ESSCIRC 2013 - Bucharest, Romania
Duration: 16 Sep 201320 Sep 2013

Publication series

NameEuropean Solid-State Circuits Conference
ISSN (Print)1930-8833

Conference

Conference39th European Solid-State Circuits Conference, ESSCIRC 2013
Country/TerritoryRomania
CityBucharest
Period16/09/1320/09/13

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