Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod; Wojciech Bury; David M. Karlin; Pravas Deria; Chung Wei Kung; Michael J. Katz; Monica So; Benjamin Klahr; Danni Jin; Yip Wah Chung; Teri W. Odom; Omar K. Farha; Joseph T. Hupp

doi:10.1002/adma.201401940

Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod
, Wojciech Bury
, David M. Karlin
, Pravas Deria
, Chung Wei Kung
, Michael J. Katz
, Monica So
, Benjamin Klahr
, Danni Jin
, Yip Wah Chung
, Teri W. Odom
, Omar K. Farha
, Joseph T. Hupp

Research output: Contribution to journal › Article › peer-review

299 Scopus citations

Abstract

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

Original language	English
Pages (from-to)	6295-6300
Number of pages	6
Journal	Advanced Materials
Volume	26
Issue number	36
DOIs	https://doi.org/10.1002/adma.201401940
State	Published - 1 Sep 2014
Externally published	Yes

Bibliographical note

Publisher Copyright:
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Funding

Funders	Funder number
Army Research Office	W911NF-13-1-0229
Northwestern University

Access to Document

10.1002/adma.201401940

Cite this

@article{dc6b620b3f524e4692fe93ce874a0c91,

title = "Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition",

abstract = "Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.",

author = "Idan Hod and Wojciech Bury and Karlin, \{David M.\} and Pravas Deria and Kung, \{Chung Wei\} and Katz, \{Michael J.\} and Monica So and Benjamin Klahr and Danni Jin and Chung, \{Yip Wah\} and Odom, \{Teri W.\} and Farha, \{Omar K.\} and Hupp, \{Joseph T.\}",

note = "Publisher Copyright: {\textcopyright} 2014 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim.",

year = "2014",

month = sep,

day = "1",

doi = "10.1002/adma.201401940",

language = "אנגלית",

volume = "26",

pages = "6295--6300",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "36",

}

TY - JOUR

T1 - Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

AU - Hod, Idan

AU - Bury, Wojciech

AU - Karlin, David M.

AU - Deria, Pravas

AU - Kung, Chung Wei

AU - Katz, Michael J.

AU - So, Monica

AU - Klahr, Benjamin

AU - Jin, Danni

AU - Chung, Yip Wah

AU - Odom, Teri W.

AU - Farha, Omar K.

AU - Hupp, Joseph T.

PY - 2014/9/1

Y1 - 2014/9/1

N2 - Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

AB - Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

UR - https://www.scopus.com/pages/publications/85015488803

U2 - 10.1002/adma.201401940

DO - 10.1002/adma.201401940

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:85015488803

SN - 0935-9648

VL - 26

SP - 6295

EP - 6300

JO - Advanced Materials

JF - Advanced Materials

IS - 36

ER -

Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Abstract

Bibliographical note

Funding

Access to Document

Other files and links

Fingerprint

Cite this