Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod, Wojciech Bury, David M. Karlin, Pravas Deria, Chung Wei Kung, Michael J. Katz, Monica So, Benjamin Klahr, Danni Jin, Yip Wah Chung, Teri W. Odom, Omar K. Farha, Joseph T. Hupp

Research output: Contribution to journalArticlepeer-review

274 Scopus citations

Abstract

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

Original languageEnglish
Pages (from-to)6295-6300
Number of pages6
JournalAdvanced Materials
Volume26
Issue number36
DOIs
StatePublished - 1 Sep 2014
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Funding

FundersFunder number
Army Research OfficeW911NF-13-1-0229
Northwestern University

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