Direct evidence for diffusion and electromigration of Cu in CuInSe2

Konstantin Gartsman, Leonid Chernyak, Vera Lyahovitskaya, David Cahen, Vladimir Didik, Vitaliy Kozlovsky, Roald Malkovich, Elena Skoryatina, Valentina Usacheva

Research output: Contribution to journalArticlepeer-review

102 Scopus citations

Abstract

Cu diffusion in chalcopyrite CuInSe2 was studied directly, using 64Cu as a radioactive tracer. For diffusion from a thin surface layer, the Cu diffusion coefficients at 380 and 430 °C, were found to vary from 10-8 to 10-9 cm2/s. In case of diffusion from a volume source at 400 °C, a value of 10-10 cm2/s was calculated from diffusion profiles. Electromigration of Cu was demonstrated, by applying a strong electric field to a sample and following the redistribution of 64Cu, that had been thermally diffused into the sample, prior to electric field application.

Original languageEnglish
Pages (from-to)4282-4285
Number of pages4
JournalJournal of Applied Physics
Volume82
Issue number9
DOIs
StatePublished - 1 Nov 1997
Externally publishedYes

Fingerprint

Dive into the research topics of 'Direct evidence for diffusion and electromigration of Cu in CuInSe2'. Together they form a unique fingerprint.

Cite this