TY - JOUR
T1 - Deposition of diamond using an electron cyclotron resonance plasma system
AU - Gilbert, Donald R.
AU - Singh, Rijiv
AU - Alexander, W. Brock
AU - Lee, Dong Gu
AU - Doering, Patrick
PY - 1994
Y1 - 1994
N2 - We have used an electron cyclotron resonance plasma system to perform chemical vapor deposition experiments on single-crystal, (110) oriented diamond substrates. The depositions were carried out at 0.060 Torr using mixtures of methanol in hydrogen. Substrate temperatures were varied from approximately 620 to 800 °C. The film morphology was examined using SEM and microstructural phase determination was attempted using micro-Raman spectroscopy. Based on the results of these experiments, we have determined general trends for the characteristics of films deposited on diamond from the ECR plasma at low pressures and temperatures.
AB - We have used an electron cyclotron resonance plasma system to perform chemical vapor deposition experiments on single-crystal, (110) oriented diamond substrates. The depositions were carried out at 0.060 Torr using mixtures of methanol in hydrogen. Substrate temperatures were varied from approximately 620 to 800 °C. The film morphology was examined using SEM and microstructural phase determination was attempted using micro-Raman spectroscopy. Based on the results of these experiments, we have determined general trends for the characteristics of films deposited on diamond from the ECR plasma at low pressures and temperatures.
UR - http://www.scopus.com/inward/record.url?scp=0028733524&partnerID=8YFLogxK
U2 - 10.1557/proc-339-301
DO - 10.1557/proc-339-301
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AN - SCOPUS:0028733524
SN - 0272-9172
VL - 339
SP - 301
EP - 306
JO - Materials Research Society Symposium - Proceedings
JF - Materials Research Society Symposium - Proceedings
T2 - Proceedings of the 1994 MRS Spring Meeting
Y2 - 4 April 1994 through 8 April 1994
ER -