Abstract
Microstructural control is a critical issue in the use of diamond films in a variety of engineering applications. Using a novel, electrostatic-based particle seeding process, we have investigated the deposition of diamond films with varying areal nucleation densities. Depositions were performed at low pressures (1.000 and 1.500 Torr) in a modified electron cyclotron resonance plasma system. Methyl alcohol was the primary diamond precursor species. Scanning electron microscopy and Raman spectroscopy were used to evaluate microstructure and composition characteristics. Comparisons in deposition characteristics were made based on relative nucleation density and gas-phase composition.
Original language | English |
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Pages (from-to) | 1326-1330 |
Number of pages | 5 |
Journal | Journal of Electronic Materials |
Volume | 26 |
Issue number | 11 |
DOIs | |
State | Published - Nov 1997 |
Externally published | Yes |
Funding
The authors would like to acknowledge the financial support of the Engineering Research Center (ERC) for Particle Stience and Technology at the University of Florida, the National Science Foundation (NSF) grant #EEC-94-02989, and Lockheed Martin Corporation.
Funders | Funder number |
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Engineering Research Center | |
National Science Foundation | #EEC-94-02989 |
Lockheed Martin Corporation | |
University of Florida |
Keywords
- Diamond films
- Electron cyclotron resonance (ECR) plasma
- Microstructural control
- Nucleation density