Deposition of adherent diamond films on sapphire substrates

Donald R. Gilbert; Rajiv K. Singh

doi:10.1557/proc-423-371

Deposition of adherent diamond films on sapphire substrates

Donald R. Gilbert, Rajiv K. Singh

University of Florida

Research output: Contribution to journal › Conference article › peer-review

Abstract

Sapphire is an important material for infrared-transmission applications and SOI device structures. The use of diamond as a protective coating for sapphire is a desirable, yet elusive process. The primary obstacle to the successful deposition of diamond on sapphire is the large mismatch in thermal expansion characteristics between the two materials. To overcome this problem, we have used a low temperature deposition process involving an electron cyclotron resonance (ECR) assisted plasma CVD system. Continuous, adherent diamond films have been deposited over 1 to 2 cm² areas. These films have been characterized for structural quality using Raman spectroscopy and x-ray diffraction.

Original language	English
Pages (from-to)	371-375
Number of pages	5
Journal	Materials Research Society Symposium - Proceedings
Volume	423
DOIs	https://doi.org/10.1557/proc-423-371
State	Published - 1996
Externally published	Yes
Event	Proceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA Duration: 8 Apr 1996 → 11 Apr 1996

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abstract = "Sapphire is an important material for infrared-transmission applications and SOI device structures. The use of diamond as a protective coating for sapphire is a desirable, yet elusive process. The primary obstacle to the successful deposition of diamond on sapphire is the large mismatch in thermal expansion characteristics between the two materials. To overcome this problem, we have used a low temperature deposition process involving an electron cyclotron resonance (ECR) assisted plasma CVD system. Continuous, adherent diamond films have been deposited over 1 to 2 cm2 areas. These films have been characterized for structural quality using Raman spectroscopy and x-ray diffraction.",

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AB - Sapphire is an important material for infrared-transmission applications and SOI device structures. The use of diamond as a protective coating for sapphire is a desirable, yet elusive process. The primary obstacle to the successful deposition of diamond on sapphire is the large mismatch in thermal expansion characteristics between the two materials. To overcome this problem, we have used a low temperature deposition process involving an electron cyclotron resonance (ECR) assisted plasma CVD system. Continuous, adherent diamond films have been deposited over 1 to 2 cm2 areas. These films have been characterized for structural quality using Raman spectroscopy and x-ray diffraction.

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Deposition of adherent diamond films on sapphire substrates

Abstract

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