CVD SYSTEM WITH SUBSTRATE CARRIER AND ASSOCIATED MECHANISMS FOR MOVING SUBSTRATE THERETHROUGH

Doron Naveh; Chen Stern; Yosi Ben-Naim; Ariel Ismach; Tal Kaufman; Eran Bar-Rabi; Elad Mentovich; Yaniv Rotem; Yaakov Gridish

CVD SYSTEM WITH SUBSTRATE CARRIER AND ASSOCIATED MECHANISMS FOR MOVING SUBSTRATE THERETHROUGH

Doron Naveh (Inventor), Chen Stern (Inventor), Yosi Ben-Naim (Inventor), Ariel Ismach (Inventor), Tal Kaufman (Inventor), Eran Bar-Rabi (Inventor), Elad Mentovich (Inventor), Yaniv Rotem (Inventor), Yaakov Gridish (Inventor)

Bar-Ilan University - The Alexander Kofkin Faculty of Engineering

Research output: Patent

Abstract

A substrate carrier and a mechanism for moving the substrate carrier through a chemical vapor deposition system are provided. The substrate carrier includes a cylindrical housing having an interior surface. A plurality of plurality of shelves fixed to the interior surface, each shelf configured to support at least one substrate. The substrate carrier may include a connector configured to engage the substrate carrier with the mechanism. The mechanism may include a moveable arm and a motor configured to actuate the moveable arm. The moveable arm may include an actuating member connected to the motor and configured to move the moveable arm between a retracted state and an extended state. The moveable arm may be configured to operate in a chamber having a first pressure and a first temperature and the motor may be configured to operate in an environment having a second pressure.

Original language	American English
Patent number	WO2022243891
IPC	H01L 21/ 677 A I
Priority date	1/07/21
State	Published - 24 Nov 2022

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title = "CVD SYSTEM WITH SUBSTRATE CARRIER AND ASSOCIATED MECHANISMS FOR MOVING SUBSTRATE THERETHROUGH",

abstract = "A substrate carrier and a mechanism for moving the substrate carrier through a chemical vapor deposition system are provided. The substrate carrier includes a cylindrical housing having an interior surface. A plurality of plurality of shelves fixed to the interior surface, each shelf configured to support at least one substrate. The substrate carrier may include a connector configured to engage the substrate carrier with the mechanism. The mechanism may include a moveable arm and a motor configured to actuate the moveable arm. The moveable arm may include an actuating member connected to the motor and configured to move the moveable arm between a retracted state and an extended state. The moveable arm may be configured to operate in a chamber having a first pressure and a first temperature and the motor may be configured to operate in an environment having a second pressure.",

author = "Doron Naveh and Chen Stern and Yosi Ben-Naim and Ariel Ismach and Tal Kaufman and Eran Bar-Rabi and Elad Mentovich and Yaniv Rotem and Yaakov Gridish",

year = "2022",

month = nov,

day = "24",

language = "American English",

type = "Patent",

note = "WO2022243891; H01L 21/ 677 A I",

}

TY - PAT

T1 - CVD SYSTEM WITH SUBSTRATE CARRIER AND ASSOCIATED MECHANISMS FOR MOVING SUBSTRATE THERETHROUGH

AU - Naveh, Doron

AU - Stern, Chen

AU - Ben-Naim, Yosi

AU - Ismach, Ariel

AU - Kaufman, Tal

AU - Bar-Rabi, Eran

AU - Mentovich, Elad

AU - Rotem, Yaniv

AU - Gridish, Yaakov

PY - 2022/11/24

Y1 - 2022/11/24

N2 - A substrate carrier and a mechanism for moving the substrate carrier through a chemical vapor deposition system are provided. The substrate carrier includes a cylindrical housing having an interior surface. A plurality of plurality of shelves fixed to the interior surface, each shelf configured to support at least one substrate. The substrate carrier may include a connector configured to engage the substrate carrier with the mechanism. The mechanism may include a moveable arm and a motor configured to actuate the moveable arm. The moveable arm may include an actuating member connected to the motor and configured to move the moveable arm between a retracted state and an extended state. The moveable arm may be configured to operate in a chamber having a first pressure and a first temperature and the motor may be configured to operate in an environment having a second pressure.

AB - A substrate carrier and a mechanism for moving the substrate carrier through a chemical vapor deposition system are provided. The substrate carrier includes a cylindrical housing having an interior surface. A plurality of plurality of shelves fixed to the interior surface, each shelf configured to support at least one substrate. The substrate carrier may include a connector configured to engage the substrate carrier with the mechanism. The mechanism may include a moveable arm and a motor configured to actuate the moveable arm. The moveable arm may include an actuating member connected to the motor and configured to move the moveable arm between a retracted state and an extended state. The moveable arm may be configured to operate in a chamber having a first pressure and a first temperature and the motor may be configured to operate in an environment having a second pressure.

M3 - Patent

M1 - WO2022243891

ER -

CVD SYSTEM WITH SUBSTRATE CARRIER AND ASSOCIATED MECHANISMS FOR MOVING SUBSTRATE THERETHROUGH

Abstract

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