CVD SYSTEM WITH FLANGE ASSEMBLY FOR FACILITATING UNIFORM AND LAMINAR FLOW

Doron Naveh; Chen Stern; Yosi Ben-Naim; Ariel Ismach; Tal Kaufman; Eran Bar-Rabi; Elad Mentovich; Yaniv Rotem; Yaakov Gridish

CVD SYSTEM WITH FLANGE ASSEMBLY FOR FACILITATING UNIFORM AND LAMINAR FLOW

Doron Naveh (Inventor), Chen Stern (Inventor), Yosi Ben-Naim (Inventor), Ariel Ismach (Inventor), Tal Kaufman (Inventor), Eran Bar-Rabi (Inventor), Elad Mentovich (Inventor), Yaniv Rotem (Inventor), Yaakov Gridish (Inventor)

Bar-Ilan University - The Alexander Kofkin Faculty of Engineering

Research output: Patent

Abstract

A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

Original language	American English
Patent number	WO2022243892
IPC	H01L 21/ 20 A I
Priority date	1/07/21
State	Published - 24 Nov 2022

Cite this

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title = "CVD SYSTEM WITH FLANGE ASSEMBLY FOR FACILITATING UNIFORM AND LAMINAR FLOW",

abstract = "A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.",

author = "Doron Naveh and Chen Stern and Yosi Ben-Naim and Ariel Ismach and Tal Kaufman and Eran Bar-Rabi and Elad Mentovich and Yaniv Rotem and Yaakov Gridish",

year = "2022",

month = nov,

day = "24",

language = "American English",

type = "Patent",

note = "WO2022243892; H01L 21/ 20 A I",

}

TY - PAT

T1 - CVD SYSTEM WITH FLANGE ASSEMBLY FOR FACILITATING UNIFORM AND LAMINAR FLOW

AU - Naveh, Doron

AU - Stern, Chen

AU - Ben-Naim, Yosi

AU - Ismach, Ariel

AU - Kaufman, Tal

AU - Bar-Rabi, Eran

AU - Mentovich, Elad

AU - Rotem, Yaniv

AU - Gridish, Yaakov

PY - 2022/11/24

Y1 - 2022/11/24

N2 - A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

AB - A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

M3 - Patent

M1 - WO2022243892

ER -

CVD SYSTEM WITH FLANGE ASSEMBLY FOR FACILITATING UNIFORM AND LAMINAR FLOW

Abstract

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