Critically coupled resonators in vertical geometry using a planar mirror and a 5 nm thick absorbing film

Jonathan R. Tischler; M. Scott Bradley; Vladimir Bulović

doi:10.1364/OL.31.002045

Critically coupled resonators in vertical geometry using a planar mirror and a 5 nm thick absorbing film

Jonathan R. Tischler
, M. Scott Bradley
, Vladimir Bulović

Massachusetts Institute of Technology

Research output: Contribution to journal › Article › peer-review

152 Scopus citations

Abstract

A (5.1±0.5) nm thick film of high oscillator strength J-aggregated dye critically couples to a single dielectric mirror, absorbing more than 97% of incident λ = 591 nm wavelength light, corresponding to an effective absorption coefficient of (6.9±0.7) × 10⁶ cm ^-1 for (film thickness)/λ < 1%.

Original language	English
Pages (from-to)	2045-2047
Number of pages	3
Journal	Optics Letters
Volume	31
Issue number	13
DOIs	https://doi.org/10.1364/OL.31.002045
State	Published - 1 Jul 2006
Externally published	Yes

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title = "Critically coupled resonators in vertical geometry using a planar mirror and a 5 nm thick absorbing film",

abstract = "A (5.1±0.5) nm thick film of high oscillator strength J-aggregated dye critically couples to a single dielectric mirror, absorbing more than 97\% of incident λ = 591 nm wavelength light, corresponding to an effective absorption coefficient of (6.9±0.7) × 106 cm -1 for (film thickness)/λ < 1\%.",

author = "Tischler, \{Jonathan R.\} and Bradley, \{M. Scott\} and Vladimir Bulovi{\'c}",

year = "2006",

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doi = "10.1364/OL.31.002045",

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AU - Tischler, Jonathan R.

AU - Bradley, M. Scott

AU - Bulović, Vladimir

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Y1 - 2006/7/1

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AB - A (5.1±0.5) nm thick film of high oscillator strength J-aggregated dye critically couples to a single dielectric mirror, absorbing more than 97% of incident λ = 591 nm wavelength light, corresponding to an effective absorption coefficient of (6.9±0.7) × 106 cm -1 for (film thickness)/λ < 1%.

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IS - 13

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Critically coupled resonators in vertical geometry using a planar mirror and a 5 nm thick absorbing film

Abstract

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