We compare the effect of two synthesis methods namely Chemical Vapor Deposition (CVD) and Ultrasonic Nebulized Spray Pyrolysis of Aqueous Combustion Mixture (UNSPACM) on the Semiconductor-Metal Transition (SMT) characteristics of VO2 thin films. The SMT characteristics of the films are measured electrically and optically. CVD films show a lower resistance ratio and SMT strength, whereas films synthesized via UNSPACM are rougher. We ascribe the reason for the observed behaviour to morphology and off-stoichiometry arising from the deposition process.
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