Comparing the effect of synthesis techniques on the semiconductor-metal transition of VO2 thin films

Bharathi Rajeswaran, Arun M. Umarji

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

We compare the effect of two synthesis methods namely Chemical Vapor Deposition (CVD) and Ultrasonic Nebulized Spray Pyrolysis of Aqueous Combustion Mixture (UNSPACM) on the Semiconductor-Metal Transition (SMT) characteristics of VO2 thin films. The SMT characteristics of the films are measured electrically and optically. CVD films show a lower resistance ratio and SMT strength, whereas films synthesized via UNSPACM are rougher. We ascribe the reason for the observed behaviour to morphology and off-stoichiometry arising from the deposition process.

Original languageEnglish
Article number134108
JournalMaterials Letters
Volume339
DOIs
StatePublished - 15 May 2023
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2023 Elsevier B.V.

Keywords

  • CVD
  • Electrical quality
  • Optical quality
  • Roughness
  • UNSPACM

Fingerprint

Dive into the research topics of 'Comparing the effect of synthesis techniques on the semiconductor-metal transition of VO2 thin films'. Together they form a unique fingerprint.

Cite this