Abstract
We compare the effect of two synthesis methods namely Chemical Vapor Deposition (CVD) and Ultrasonic Nebulized Spray Pyrolysis of Aqueous Combustion Mixture (UNSPACM) on the Semiconductor-Metal Transition (SMT) characteristics of VO2 thin films. The SMT characteristics of the films are measured electrically and optically. CVD films show a lower resistance ratio and SMT strength, whereas films synthesized via UNSPACM are rougher. We ascribe the reason for the observed behaviour to morphology and off-stoichiometry arising from the deposition process.
Original language | English |
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Article number | 134108 |
Journal | Materials Letters |
Volume | 339 |
DOIs | |
State | Published - 15 May 2023 |
Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2023 Elsevier B.V.
Funding
BR thanks CeNSE, IISc, Prof. S. Anantha Ramakrishna, Director, CSIR-CSIO, & Department of Physics, IIT Kanpur for characterization facilities. This project is not funded by any agency.
Funders | Funder number |
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CSIR-Central Scientific Instruments Organisation |
Keywords
- CVD
- Electrical quality
- Optical quality
- Roughness
- UNSPACM