Abstract
The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 °C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.
| Original language | English |
|---|---|
| Pages (from-to) | 488-494 |
| Number of pages | 7 |
| Journal | Journal of Materials Research |
| Volume | 15 |
| Issue number | 2 |
| DOIs | |
| State | Published - Feb 2000 |
| Externally published | Yes |
Funding
Part of this research is funded by a grant from the United States Department of Energy, No. DE-FG05-95ER45533.
| Funders | Funder number |
|---|---|
| U.S. Department of Energy | DE-FG05-95ER45533 |