Characteristics of ultraviolet-assisted pulsed-laser-deposited Y2O3 thin films

V. Craciun, E. S. Lambers, N. D. Bassim, R. K. Singh

Research output: Contribution to journalArticlepeer-review

20 Scopus citations


The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 °C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers.

Original languageEnglish
Pages (from-to)488-494
Number of pages7
JournalJournal of Materials Research
Issue number2
StatePublished - Feb 2000
Externally publishedYes


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