Abstract
Among the commercially common transparent conducting oxides (TCOs) are fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO), neither of which meets all criteria for the optimal TCO. Despite its superior chemical stability and being composed of abundant elements, FTO suffers from high surface roughness compared to ITO. Here, we introduce a path to substantially decrease the surface roughness of FTO, while preserving most of its original advantages, by depositing an SnO2 coating on top of the FTO layer using pulsed laser deposition. Such an enhancement may allow future use of FTO in devices that use now the more expensive, less stable ITO, which contains relatively rare indium.
| Original language | English |
|---|---|
| Pages (from-to) | 1358-1362 |
| Number of pages | 5 |
| Journal | MRS Communications |
| Volume | 8 |
| Issue number | 3 |
| DOIs | |
| State | Published - 1 Sep 2018 |
Bibliographical note
Publisher Copyright:Copyright © Materials Research Society 2018.
Funding
Among the commercially common transparent conducting oxides (TCOs) are fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO), neither of which meets all criteria for the optimal TCO. Despite its superior chemical stability and being composed of abundant elements, FTO suffers from high surface roughness compared to ITO. Here, we introduce a path to substantially decrease the surface roughness of FTO, while preserving most of its original advantages, by depositing an SnO 2 coating on top of the FTO layer using pulsed laser deposition. Such an enhancement may allow future use of FTO in devices that use now the more expensive, less stable ITO, which contains relatively rare indium. Israeli National Nanotechnology Initiative INNI, FTA project Israeli Ministry of Science, Technology, and Space project 204428 Israel Science Foundation 10.13039/501100003977 grant 1729/15 pdf S2159685918001799a.pdf
| Funders | Funder number |
|---|---|
| FTA project Israeli Ministry of Science, Technology, and Space project 204428 Israel Science Foundation | 1729/15, 10.13039/501100003977, S2159685918001799a.pdf |
| National Nanotechnology Initiative |