Can fluorine-doped tin Oxide, FTO, be more like indium-doped tin oxide, ITO? Reducing FTO surface roughness by introducing additional SnO2 coating

David A. Keller, Hannah Noa Barad, Eli Rosh-Hodesh, Arie Zaban, David Cahen

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Among the commercially common transparent conducting oxides (TCOs) are fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO), neither of which meets all criteria for the optimal TCO. Despite its superior chemical stability and being composed of abundant elements, FTO suffers from high surface roughness compared to ITO. Here, we introduce a path to substantially decrease the surface roughness of FTO, while preserving most of its original advantages, by depositing an SnO2 coating on top of the FTO layer using pulsed laser deposition. Such an enhancement may allow future use of FTO in devices that use now the more expensive, less stable ITO, which contains relatively rare indium.

Original languageEnglish
Pages (from-to)1358-1362
Number of pages5
JournalMRS Communications
Volume8
Issue number3
DOIs
StatePublished - 1 Sep 2018

Bibliographical note

Publisher Copyright:
Copyright © Materials Research Society 2018.

Funding

Among the commercially common transparent conducting oxides (TCOs) are fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO), neither of which meets all criteria for the optimal TCO. Despite its superior chemical stability and being composed of abundant elements, FTO suffers from high surface roughness compared to ITO. Here, we introduce a path to substantially decrease the surface roughness of FTO, while preserving most of its original advantages, by depositing an SnO 2 coating on top of the FTO layer using pulsed laser deposition. Such an enhancement may allow future use of FTO in devices that use now the more expensive, less stable ITO, which contains relatively rare indium. Israeli National Nanotechnology Initiative INNI, FTA project Israeli Ministry of Science, Technology, and Space project 204428 Israel Science Foundation 10.13039/501100003977 grant 1729/15 pdf S2159685918001799a.pdf

FundersFunder number
FTA project Israeli Ministry of Science, Technology, and Space project 204428 Israel Science Foundation1729/15, 10.13039/501100003977, S2159685918001799a.pdf
National Nanotechnology Initiative

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