Atomic layer deposition of metal-oxide thin films on cellulose fibers

Ortal Lidor-shalev, Yacov Carmiel, Nikolaos Pliatsikas, Panos Patsalas, Yitzhak Mastai

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Atomic layer deposition (ALD) is a vapor-phase technique capable of producing inorganic thin films with precise control over the thickness of the film. The ALD method offers high precision in the design of advanced 3D nanostructures. In this article, silica and alumina thin films have been grown over fibers of cellulose by the ALD process. The morphology and the chemical composition of the fabricated thin films are characterized, as well as their thermal durability through elevated temperatures. Moreover, XPS is used to confirm the phases of the alumina nanofilms and to further understand the deposition process on the cellulose microfibers.

Original languageEnglish
Pages (from-to)2043-2052
Number of pages10
JournalJournal of Coordination Chemistry
Volume71
Issue number11-13
DOIs
StatePublished - 3 Jul 2018

Bibliographical note

Publisher Copyright:
© 2018, © 2018 Informa UK Limited, trading as Taylor & Francis Group.

Funding

This research was supported by the Israel Science Foundation (ISF) (Grant No. 1549/17) titled “Chiral metal-oxides surfaces: Synthesis, characterization, and applications.” Ortal Lidor-Shalev would like to acknowledge the Ministry of Science, Technology & Space, Israel, for a Ph.D. scholarship, and for the COST organization and European cooperation in science and technology (HERALD COST action MP1402).

FundersFunder number
European Cooperation in Science and TechnologyMP1402
Ministry of Science, Technology and Space
Israel Science Foundation1549/17

    Keywords

    • Atomic layer deposition
    • X-ray photoelectron spectroscopy
    • metal-oxides
    • nanomaterials
    • surface chemistry

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