Abstract
Atomic layer deposition (ALD) is a vapor-phase technique capable of producing inorganic thin films with precise control over the thickness of the film. The ALD method offers high precision in the design of advanced 3D nanostructures. In this article, silica and alumina thin films have been grown over fibers of cellulose by the ALD process. The morphology and the chemical composition of the fabricated thin films are characterized, as well as their thermal durability through elevated temperatures. Moreover, XPS is used to confirm the phases of the alumina nanofilms and to further understand the deposition process on the cellulose microfibers.
Original language | English |
---|---|
Pages (from-to) | 2043-2052 |
Number of pages | 10 |
Journal | Journal of Coordination Chemistry |
Volume | 71 |
Issue number | 11-13 |
DOIs | |
State | Published - 3 Jul 2018 |
Bibliographical note
Publisher Copyright:© 2018, © 2018 Informa UK Limited, trading as Taylor & Francis Group.
Funding
This research was supported by the Israel Science Foundation (ISF) (Grant No. 1549/17) titled “Chiral metal-oxides surfaces: Synthesis, characterization, and applications.” Ortal Lidor-Shalev would like to acknowledge the Ministry of Science, Technology & Space, Israel, for a Ph.D. scholarship, and for the COST organization and European cooperation in science and technology (HERALD COST action MP1402).
Funders | Funder number |
---|---|
European Cooperation in Science and Technology | MP1402 |
Ministry of Science, Technology and Space | |
Israel Science Foundation | 1549/17 |
Keywords
- Atomic layer deposition
- X-ray photoelectron spectroscopy
- metal-oxides
- nanomaterials
- surface chemistry