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Atomic layer deposition of enantioselective thin film of alumina on chiral self-assembled-monolayer

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Abstract

In this paper, we describe the synthesis of new chiral nanosized surfaces based on chiral self-assembled monolayers coated with metal oxide (Al2O3) nanolayers. In this new type of nanosized chiral surface, the Al2O3 nanolayers enable the protection of the chiral self-assembled monolayers while preserving their enantioselective nature. The chiral nature of the SAMs/Al2O3 films was characterized by a variety of techniques, such as, quartz crystal microbalance, circular dichroism (CD) spectroscopy and chiral crystallization. The proposed methodology for the preparation of nanoscale chiral surfaces described in this article could open up opportunities in other fields of chemistry, such as chiral catalysis.

Original languageEnglish
Pages (from-to)88-93
Number of pages6
JournalSurface Science
Volume629
DOIs
StatePublished - Nov 2014

Bibliographical note

Publisher Copyright:
© 2014 Elsevier B.V.

Funding

H. Moshe and G. Levi would like to acknowledge the BIU Department of Chemistry for funding. This research was supported by the Israel Science Foundation (grant no. 660/07 ).

FundersFunder number
Israel Science Foundation660/07

    Keywords

    • AlO
    • Chiral self-assembled monolayers
    • Chiral surfaces
    • Enantioselective crystallization

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