Abstract
Gain-cell embedded DRAM (GC-eDRAM) is an attractive alternative to traditional SRAM, due to its high-density, low-leakage, and inherent 2-ported operation, yet, its dynamic nature leads to limited retention time that requires periodic, power-hungry refresh cycles. This drawback is further aggravated in scaled technologies, where increased leakage currents and decreased in-cell storage capacitances lead to accelerated data integrity deterioration. However, the emerging approximate computing paradigm utilizes the inherent error resilience of some applications to tolerate data errors. Such error tolerance can be exploited by reducing the refresh rate in GC-eDRAM to achieve a substantial decrease in power consumption, at the cost of an increase in cell failure probability. In this paper, we present the first fabricated and fully functional GC-eDRAM in a 28nm bulk CMOS technology. The array, which is based on a novel mixed-VT 4T bitcell, can be used in both traditional and for approximate computing applications, featuring a small silicon footprint and supporting high-performance operation. Silicon measurements demonstrate successful operation at 800 Mhz under a 900 mV supply, while retaining almost 30% lower area than a singleported 6T SRAM in the same technology.
Original language | English |
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Title of host publication | ESSCIRC 2017 - 43rd IEEE European Solid State Circuits Conference |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 308-311 |
Number of pages | 4 |
ISBN (Electronic) | 9781509050253 |
DOIs | |
State | Published - 2 Nov 2017 |
Event | 43rd IEEE European Solid State Circuits Conference, ESSCIRC 2017 - Leuven, Belgium Duration: 11 Sep 2017 → 14 Sep 2017 |
Publication series
Name | ESSCIRC 2017 - 43rd IEEE European Solid State Circuits Conference |
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Conference
Conference | 43rd IEEE European Solid State Circuits Conference, ESSCIRC 2017 |
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Country/Territory | Belgium |
City | Leuven |
Period | 11/09/17 → 14/09/17 |
Bibliographical note
Publisher Copyright:© 2017 IEEE.
Funding
V. CONCLUSIONS Approximate storage offers a compromise between improved memory density and power to decreased reliability, which can be tolerated by approximate computing applications. We demonstrated a novel mixed-VT 4T gain-cell implementation in a 28 nm logic process. The memory macro operates at a 800 Mhz frequency, more than any other gain-cell implementation in literature. Moreover, it provides almost 30% lower area compared to a conventional, single-ported, SRAM. The array can be operated with a 5 µs retention time with a 99% yield, suitable for approximate storage systems. Technology scaling to below 20 nm process nodes can be beneficial for the proposed GC-eDRAM technology as enhanced control of the channel using FD-SOI or FinFET technologies can result in lower sub-VT leakage and higher DRT. Moreover, “pushed-rules” layout of the GC-eDRAM bit-cell will result in even higher area savings. ACKNOWLEDGEMENT The authors would like to thank Yaniv Strassberg, Idan Hashai, Keren Talisveyberg, Ofer Shalev, Roy Kauffman, Ilan Braun, Omer Eini, and Roman Golman for their help in the design and measurements of the test-chip. This work was supported by the HiPer Consortium funded by the Israeli Innovation Authority.
Funders | Funder number |
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HiPer Consortium | |
Israeli Innovation Authority |