Abstract
Strongly correlated systems famously show intriguing (and unexpected) phenomena. The layered 1T-TaS₂ is no exception, showing different charge density wave configurations, metal insulator transitions (MITs), a fascinating superconducting phase, and low-temperature meta-stable hidden phases upon light or current pulses. And now – also a non-volatile memory effect. The memory forms following cooling of the sample to a chosen temperature in the metal-insulator coexisting phase of the Mott MIT (≈180 K) then ramping back up to the metallic state. It manifests as a resistance decrease in the following R versus T measurement that is largest at the ramp-reversal temperature. The memory disappears after cooling to lower temperatures and the original R versus T is recovered. Memory properties are shown to coincide with those of the ramp reversal memory (RRM) previously reported in correlated oxides, including non-volatility and the ability to write more than one memory. However, there are notable differences and a different origin. These findings indicate that RRM extends beyond oxides, highlighting its universality in correlated materials having the necessary ingredients: phase transition with spatial phase coexistence and a mechanism that locally modifies the transition properties. These findings open new opportunities for exploring memory phenomena in correlated materials.
Original language | English |
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Journal | Advanced Functional Materials |
DOIs | |
State | Accepted/In press - 2025 |
Bibliographical note
Publisher Copyright:© 2025 The Author(s). Advanced Functional Materials published by Wiley-VCH GmbH.
Keywords
- correlated electron systems
- metal insulator phase transition
- non-volatile memory
- phase coexistence
- ramp reversal memory
- TaS
- transition metal dichalcogenides