A 24 kb single-well mixed 3T gain-cell eDRAM with body-bias in 28 nm FD-SOI for refresh-free DSP applications

Jonathan Narinx, Robert Giterman, Andrea Bonetti, Nicolas Frigerio, Cosimo Aprile, Andreas Burg, Yusuf Leblebici

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

9 Scopus citations

Abstract

Logic-compatible gain-cell embedded DRAM (GC-eDRAM) is an emerging alternative to conventional SRAM for memory-dominated system-on-chip (SoC) designs due to its high-density, low-power, and two-ported operation. Although GCs have a limited data retention time (DRT) at deeply scaled technology nodes, there are many DSP applications which only require short-term data storage and can therefore avoid refresh. In this paper, we present a novel single-well mixed 3T GC implementation in 28 nm FD-SOI technology. The proposed GC is supplied with body-bias control to improve the DRT by suppressing the leakage through the write port, and extend the maximum operating frequency by forward body-biasing the read port. A 24 kbit GC-eDRAM macro implementing the proposed 3T GC was fabricated in 28 nm FD-SOI technology, resulting in the highest density logic-compatible embedded memory fabricated in any 28 nm process with over 2× higher density compared to a 6T SRAM cell, over 4× higher DRT compared to a conventional 3T GC, and 38×–47× lower static power compared to conventional single-ported and two-ported SRAMs.

Original languageEnglish
Title of host publicationProceedings - 2019 IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages219-222
Number of pages4
ISBN (Electronic)9781728151069
DOIs
StatePublished - Nov 2019
Externally publishedYes
Event15th IEEE Asian Solid-State Circuits Conference, A-SSCC 2019 - Macao, China
Duration: 4 Nov 20196 Nov 2019

Publication series

NameProceedings - 2019 IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
Volume2019-November

Conference

Conference15th IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
Country/TerritoryChina
CityMacao
Period4/11/196/11/19

Bibliographical note

Publisher Copyright:
© 2019 Institute of Electrical and Electronics Engineers Inc.. All rights reserved.

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