Nano Scribe [3D Printer Quantum X Shape (Nanoscribe)]

  • Moshe Feldberg (Manager)

Equipment/facility: Equipment

    Equipments Details

    Description

    Layer-by-layer 3D printing based on Two-Photon Polymerization (2PP),
    Two-Photon Grayscale Lithography (2GL®) with voxel tuning capability.

    Specifications:

    - Minimum Surface roughness (Ra) ~ 5nm
    - Minimu Feature size ~ 100nm
    - Minimum Shape Accuracy ~200nm
    - Maximum Single print field diameter ~ 4,000µm
    - Maximum print area 50×50 mm2

    Contact Person: Moshe Feldberg
    https://nano.biu.ac.il/feldberg

    Details

    NameNanoScribe Quantum Shape X
    ManufacturersNANOSCRIBE GmbH

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