Equipments Details
Description
PVD system for thin layer deposition using Ion Beam Sputtering and ion assist for high-end thin film deposition process.
Specifications:
- 4 targets and ION ASSIST/Etch source
- Lower pressure sputter deposition (10-4 Torr)
- High quality, smooth, pin hole free films
- Enhanced adhesion and micro-structure control
- Independent control of ion beam parameters allows user to engineer film for desired properties
https://www.intlvac.com/Systems/Ion-Beam-Sputter-Deposition
Contact Person:
Dr. Joseph (Sergey) Kantorovitsch
https://nano.biu.ac.il/node/8599
Specifications:
- 4 targets and ION ASSIST/Etch source
- Lower pressure sputter deposition (10-4 Torr)
- High quality, smooth, pin hole free films
- Enhanced adhesion and micro-structure control
- Independent control of ion beam parameters allows user to engineer film for desired properties
https://www.intlvac.com/Systems/Ion-Beam-Sputter-Deposition
Contact Person:
Dr. Joseph (Sergey) Kantorovitsch
https://nano.biu.ac.il/node/8599
Details
| Name | Ion Beam Sputter Deposition (IBSD) |
|---|---|
| Manufacturers | IntlVac |
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