Ion Beam Assist System [Sputter Deposition (IBSD), IntlVac ]

  • Joseph Kantorovitsch (Manager)

Equipment/facility: Equipment

Equipments Details


PVD system for thin layer deposition using Ion Beam Sputtering and ion assist for high-end thin film deposition process.


- 4 targets and ION ASSIST/Etch source
- Lower pressure sputter deposition (10-4 Torr)
- High quality, smooth, pin hole free films
- Enhanced adhesion and micro-structure control
- Independent control of ion beam parameters allows user to engineer film for desired properties

Contact Person:
Dr. Joseph (Sergey) Kantorovitsch


NameIon Beam Sputter Deposition (IBSD)


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