Equipments Details
Description
The Helios 5UC is a dual beam instrument combining scanning electron beam (SEM) and Focused Ion Beam (FIB) technologies as well as gas chemistries, different detectors and manipulators. Various applications with nano to micro scale resolution can be performed using the FIB for patterning, milling, cross section, materials deposition, High Resolution SEM imaging, 3D Imaging, EDS, Cryo cut & imaging.
Specifications
• Dual beam FIB • TEM sample preparation • Cross section • Failure analysis • Patterning • Micro probing
E-Beam resolution- 0.6nm
Ion-Beam resolution- 2.5nm
Detectors- TLD, ICD, MD, ETD, ICE, STEM, EDS
Chemical deposition- W, C, SiO
Chemical etcher- XeF2
Cross section
High quality TEM sample preparation
3D imaging
Patterning
Failure analysis
Cryo cut & imaging
Specifications
• Dual beam FIB • TEM sample preparation • Cross section • Failure analysis • Patterning • Micro probing
E-Beam resolution- 0.6nm
Ion-Beam resolution- 2.5nm
Detectors- TLD, ICD, MD, ETD, ICE, STEM, EDS
Chemical deposition- W, C, SiO
Chemical etcher- XeF2
Cross section
High quality TEM sample preparation
3D imaging
Patterning
Failure analysis
Cryo cut & imaging
Details
Name | Helios 5 UC DualBeam for Materials Science |
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Manufacturers | Thermo Fisher Scientific, Inc. |
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