Equipments Details
Description
PVD system for thin layer deposition using E-BEAM and Thermal with ion assist.
The system is suitable for up to 12" wafers !!! with double crystal QTM for high-accuracy deposition.
Specifications:
- Substrates up to diameter of 300 mm
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock
Contact Person:
Dr. Joseph Kantorovitsch
https://nano.biu.ac.il/node/8599
The system is suitable for up to 12" wafers !!! with double crystal QTM for high-accuracy deposition.
Specifications:
- Substrates up to diameter of 300 mm
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock
Contact Person:
Dr. Joseph Kantorovitsch
https://nano.biu.ac.il/node/8599
Details
Name | E-BEAM Evaporation System (Custom Made) |
---|---|
Manufacturers | VST |

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