E-BEAM Evaporation System

  • Joseph Kantorovitsch (Manager)

Equipment/facility: Equipment

Equipments Details


PVD system for thin layer deposition using E-BEAM and Thermal with ion assist.

The system is suitable for up to 12" wafers !!! with double crystal QTM for high-accuracy deposition.


- Substrates up to diameter of 300 mm
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock

Contact Person:
Dr. Joseph Kantorovitsch


NameE-BEAM Evaporation System (Custom Made)


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