Atomic Layer Deposition [Fiji200, Ultratech/Cambridge Nanotech Intlvac]

  • Yossi Abulafia (Manager)

Equipment/facility: Equipment

Equipments Details


Atomic Layer Deposition (or ALD) is an advanced deposition technique that allows for ultra-thin films of a few nanometres to be deposited in a precisely controlled way.


- 6 precursor heated lines
- ICP Plasma
- Ozone reactor
- Material: Oxides
- Unique design for ultra-high aspect ratio structures (> 1:2000)


NameFiji F200
ManufacturersCambridge NanoTech


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