Equipments Details
Description
Rutherford Backscattering Spectroscopy (RBS)
The nondestructive and multielemental analysis technique
Elemental composition (stoichiometry) without a standard (1 - 5% accuracy).
Elemental depth profiles with a depth resolution of 2 - 10 nanometers and a maximum depth of 2 - 20 microns.
Surface impurities and impurity distribution in depth (sensitivity up to the sub-ppm range).
Elemental areal density and thus thickness (or density) of thin films if the film density (or thickness) is known.
Diffusion depth profiles between interfaces up to a few microns below the surface.
Channeling-RBS is used to determine the lattice location of impurities and defect distribution depth profile in single crystalline samples.
Specifications
Nondestructive and multielemental analysis technique
Elemental composition (stoichiometry) without a standard (1 - 5% accuracy).
Elemental depth profiles with a depth resolution of 2 - 10 nanometers and a maximum depth of 2 - 20 microns.
Surface impurities and impurity distribution in depth (sensitivity up to sub-ppm range).
Elemental areal density and thus thickness (or density) of thin films if the film density (or thickness) is known.
Diffusion depth profiles between interfaces up to a few microns below the surface.
Channeling - RBS is used to determine lattice location of impurities and defect distribution depth profile in single crystalline samples
The nondestructive and multielemental analysis technique
Elemental composition (stoichiometry) without a standard (1 - 5% accuracy).
Elemental depth profiles with a depth resolution of 2 - 10 nanometers and a maximum depth of 2 - 20 microns.
Surface impurities and impurity distribution in depth (sensitivity up to the sub-ppm range).
Elemental areal density and thus thickness (or density) of thin films if the film density (or thickness) is known.
Diffusion depth profiles between interfaces up to a few microns below the surface.
Channeling-RBS is used to determine the lattice location of impurities and defect distribution depth profile in single crystalline samples.
Specifications
Nondestructive and multielemental analysis technique
Elemental composition (stoichiometry) without a standard (1 - 5% accuracy).
Elemental depth profiles with a depth resolution of 2 - 10 nanometers and a maximum depth of 2 - 20 microns.
Surface impurities and impurity distribution in depth (sensitivity up to sub-ppm range).
Elemental areal density and thus thickness (or density) of thin films if the film density (or thickness) is known.
Diffusion depth profiles between interfaces up to a few microns below the surface.
Channeling - RBS is used to determine lattice location of impurities and defect distribution depth profile in single crystalline samples
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Research output
- 2 Article
-
Correlation between density and hydrogen content in vertically aligned carbon nanotube forests by ion beam analysis
Girshevitz, O., Richter, V., Avraham, E. S., Nessim, G. D. & Gouzman, I., 1 Nov 2017, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 6, 061403.Research output: Contribution to journal › Article › peer-review
1 Scopus citations -
Charging effects in the ion beam analysis of insulating polymers
Gotlib-Vainshtein, K., Girshevitz, O., Richter, V. & Sukenik, C. N., 20 Jul 2015, In: Polymer. 72, p. 59-62 4 p.Research output: Contribution to journal › Article › peer-review
13 Scopus citations